| 系統識別號 | 718468 | | 篇 名 | 电解致酸脱保护DNA在片合成研究 | | 並列篇名 | In Situ Synthesis of DNA Microarray by Means of Deprotection with Acid by Electrolysis | | 作 者 | 王轶文(Yi-Wen Wang);徐吉庆(Ji-Qing Xu);陈扬(Yang Chen);何农跃(Nong-Yue He) | | 刊 名 | 東南大學學報(自然科學版) | | 卷期/出版年月 | 32卷1期(2002/01) | | 頁次 | 77-80 | | 資料語文 | 中文 | | 摘要 | 提出了以电解致酸脱保护法为特征的电助DNA在片合成新方法。在2.0V电解电位下电解水,释放氢离子并富集于阳极极板附近,导致局部酸度增强,使核酸单体分子发生脱保护反应。测定了该合成方法的合成产率与电解时间,支持电解质浓度,水浓度等条件的关系。结果表明,电解时间越长,脱保护效率越高,两者基本呈线性关系;支持电解质浓度与水浓度等条件对脱保护效率基本无影响。 In order to develop a new approach to prepare high-density genechip with in situ synthesis, the authors propose a way to synthesize DNA microarrays by means of deprotection with acid generated by electrolyzing some substances in solvent. Water can release protons when electrolyzed at 2.0 V, leading to the increase of acidity on anode. Therefore, DMT protecting group can be removed. The relationship between the synthesis efficiency and other conditions, such as electrolysis time, concentration of electrolyte, concentration of water and so on was measured. It was found that the longer the electrolysis time, the higher the deprotection efficiency. The concentrations of electrolyte and water have little influence on deprotection efficiency. | | 關鍵詞 | 基因芯片,在片合成,电解致酸脱保护,金片硫醇自组装,DMT紫外吸收;genechip,in situ synthesis,deprotection with acid by electrolysis,thiol self-assembled,DMT UV absorption | | CEPS分類 | 學科別>自然科學>綜合 學科別>應用科學>綜合 學科別>醫學與生命科學>生命科學 |
|